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Fourier ellipsometry – an ellipsometric approach to Fourier scatterometry

Petrik, P. (Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, H-1121 Budapest, Konkoly Thege u. 29-33, Hungary), Kumar, N. (Optics Research Group, Department of Imaging Science and Technology, Faculty of Applied Sciences, Delft University of Technology, P. O. Box 5046, 2600GA Delft, The Netherlands), Fried, M. (Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, H-1121 Budapest, Konkoly Thege u. 29-33, Hungary), Fodor, B. (Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, H-1121 Budapest, Konkoly Thege u. 29-33, Hungary), Juhasz, G. (Institute for Technical Physics and Materials Science, Hungarian Academy of Sciences, H-1121 Budapest, Konkoly Thege u. 29-33, Hungary), Pereira, S.E. (Optics Research Group, Department of Imaging Physics, Faculty of Applied Sciences, Delft University of Technology, P. O. Box 5046, 2600GA Delft, The Netherlands), Burger, S. (Zuse Institute Berlin (ZIB), Takustrasse 7, D-14195 Berlin, Germany) and Urbach, H. P. (Optics Research Group, Department of Imaging Physics, Faculty of Applied Sciences, Delft University of Technology, P. O. Box 5046, 2600GA Delft, The Netherlands)
Keywords:

Optical metrology, ellipsometry, scatterometry, RCWA, Fourier scatterometry, sensitivity

Document typeArticle
Journal title / SourceJEOS
Peer-reviewed articleYes
Volume10
Publication date 2015
ISSN1990-2573
DOI10.2971/jeos.2015.15002
LanguageEnglish

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