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Nanometrology on Gratings with GISAXS: FEM Reconstruction and Fourier Analysis

Soltwisch, V. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Wernecke, J. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Haase, A. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Probst, J. (Helmholtz-Zentrum Berlin (HZB), Hahn-Meitner-Platz 1, D{ 14 109 Berlin, Germany), Schoengen, M. (Helmholtz-Zentrum Berlin (HZB), Hahn-Meitner-Platz 1, D{ 14 109 Berlin, Germany), Krumrey, M. (Physikalisch-Technische Bundesanstalt Braunschweig and Berlin, Bundesallee 100, D- 38116, Braunschweig, Germany) and Scholze, F. (Physikalisch-Technische Bundesanstalt Braunschweig and Berlin, Bundesallee 100, D- 38116, Braunschweig, Germany)
Keywords:

optical metrology, computational lithography, nite element method, grazing incidence scatterometry, electron beam lithography, Fourier transformation

Document typeProceeding
Journal title / SourceProc SPIE
Publication date 2015
Conference nameSPIE Metrology, Inspection, and Process Control for Microlithography XXVII
Conference dateFebruary 23, 2014
Conference placeSan Jose, California, United States
DOI10.1117/12.2046212
LanguageEnglish

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