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Low contact resistance in epitaxial graphene devices for quantum metrology

Yager, T. (Department of Microtechnology and Nanoscience, Göteborg, Sweden), Lartsev, A. (Department of Microtechnology and Nanoscience, Göteborg, Sweden), Cedergren, K. (School of Physics, University of New South Wales, Sydney, Australia), Yakimova, R. (Department of Physics, Linköping University, Linköping, Sweden), Panchal, V. (National Physical Laboratory, Teddington, United Kingdom), Kazakova, O. (National Physical Laboratory, Teddington, United Kingdom), Tzalenchuk, A. (National Physical Laboratory, Teddington, United Kingdom/ Department of Physics, University of London, Egham, United Kingdom), Ho Kim, K. (Department of Physics and Astronomy, Seoul National University, Seoul, Korea), Woo Park, Y. (Department of Physics and Astronomy, Seoul National University, Seoul, Korea), Lara-Avila, S. (Department of Microtechnology and Nanoscience, Göteborg, Sweden) and Kubatkin, S. (Department of Microtechnology and Nanoscience, Göteborg, Sweden)
Keywords:

epitaxial graphene, monolayer, measurement, Quantum Hall, bilayer, graphene, chemical sciences, Kemi

Document typeArticle
Journal title / SourceLow contact resistance in epitaxial graphene devices
Peer-reviewed articleYes
Volume5
Issue8
Page numbers / Article number087134
Publisher's nameAMER INST PHYSICS
Publication date 2015
DOI10.1063/1.4928653
Web URLhttp://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-122071
LanguageEnglish

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