Characterization of High-k Nanolayers by Grazing Incidence X-ray Spectrometry
Muller, M. (Physikalisch-Technische Bundesanstalt (PTB), Abbestr. 2-12, 10587 Berlin, Germany), Honicke, P. (Physikalisch-Technische Bundesanstalt (PTB), Abbestr. 2-12, 10587 Berlin, Germany), Detlefs, B. (CEA Laboratory of Electronics and Information Technologies (LETI), Minatec Campus, 17 rue des Martyrs, 38054 Grenoble, France) and Fleischmann, C. (Imec, Kapeldreef 75, BE-3001 Leuven, Belgium)GIXRF; layer thickness; gate stack; reference-free analysis, ALD
| Document type | Article |
| Journal title / Source | Materials |
| Peer-reviewed article | Yes |
| Volume | 7 |
| Issue | 4 |
| Page numbers / Article number | 3147-3159 |
| Publisher's name | MDPI |
| Publisher's address (city only) | Basel Switzeland |
| Publication date | 2014-04-17 |
| ISSN | 1996-1944 |
| DOI | 10.3390/ma7043147 |
| Web URL | http://www.mdpi.com/1996-1944/7/4/3147 |
| Language | English |