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Characterization of High-k Nanolayers by Grazing Incidence X-ray Spectrometry

Muller, M. (Physikalisch-Technische Bundesanstalt (PTB), Abbestr. 2-12, 10587 Berlin, Germany), Honicke, P. (Physikalisch-Technische Bundesanstalt (PTB), Abbestr. 2-12, 10587 Berlin, Germany), Detlefs, B. (CEA Laboratory of Electronics and Information Technologies (LETI), Minatec Campus, 17 rue des Martyrs, 38054 Grenoble, France) and Fleischmann, C. (Imec, Kapeldreef 75, BE-3001 Leuven, Belgium)
Keywords:

GIXRF; layer thickness; gate stack; reference-free analysis, ALD

Document typeArticle
Journal title / SourceMaterials
Peer-reviewed articleYes
Volume7
Issue4
Page numbers / Article number3147-3159
Publisher's nameMDPI
Publisher's address (city only)Basel Switzeland
Publication date 2014-04-17
ISSN1996-1944
DOI10.3390/ma7043147
Web URLhttp://www.mdpi.com/1996-1944/7/4/3147
LanguageEnglish

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