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hp-finite element method for simulating light scattering from complex 3D structures

Burger, S. (JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany; Zuse Institute Berlin (ZIB), Takustraße 7, D– 14 195 Berlin, Germany), Zschiedrich, L. (JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany), Pomplun, J. (JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany), Herrmann, S. (Zuse Institute Berlin (ZIB), Takustraße 7, D– 14 195 Berlin, Germany; JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany) and Schmidt, F. (JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany; Zuse Institute Berlin (ZIB), Takustraße 7, D– 14 195 Berlin, Germany)
Keywords:

Scatterometry, optical metrology, computational metrology, computational lithography, 3D rigorous electromagnetic field simulations, finite-element methods, hp-FEM

Document typeProceeding
Journal title / SourceProc SPIE
Peer-reviewed articleYes
Volume9424
Publication date 2015
Conference nameMetrology, Inspection, and Process Control for Microlithography XXIX
Conference dateFebruary 22, 2015
Conference placeSan Jose, California, United States
DOI10.1117/12.2085795
LanguageEnglish

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