Optical characterisation of patterned thin films
Rosu, DR (BAM-Federal Institute for Materials Research and Testing, Unter den Eichen 87, 12200 Berlin, Germany), Petrik, PP (Research Centre for Natural Sciences, Institute for Technical Physics and Materials Science, Konkoly Thege Rd. 29-33, 1121 Budapest, Hungary), Rattmann, GR (Fraunhofer IISB, Schottkystrasse 10, 91058 Erlangen, Germany), Schellenberger, MS (Fraunhofer IISB, Schottkystrasse 10, 91058 Erlangen, Germany), Beck, UB (BAM-Federal Institute for Materials Research and Testing, Unter den Eichen 87, 12200 Berlin, Germany) and Hertwig, AH (BAM-Federal Institute for Materials Research and Testing, Unter den Eichen 87, 12200 Berlin, Germany)Spectroscopic imaging and mapping ellipsometry, Inhomogeneous and patterned thin films, SiO2, Photoresist
| Document type | Article |
| Journal title / Source | Thin Solid Films |
| Peer-reviewed article | Yes |
| Volume | 571 |
| Issue | 3 |
| Page numbers / Article number | 601-604 |
| Publisher's name | Elsevier |
| Publisher's address (city only) | Amsterdam, Netherlands |
| Publication date | 2014-11-28 |
| ISSN | 0040-6090 |
| DOI | 10.1016/j.tsf.2013.11.052 |
| Web URL | http://www.sciencedirect.com/science/article/pii/S0040609013019056 |
| Language | English |