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Optical characterisation of patterned thin films

Rosu, DR (BAM-Federal Institute for Materials Research and Testing, Unter den Eichen 87, 12200 Berlin, Germany), Petrik, PP (Research Centre for Natural Sciences, Institute for Technical Physics and Materials Science, Konkoly Thege Rd. 29-33, 1121 Budapest, Hungary), Rattmann, GR (Fraunhofer IISB, Schottkystrasse 10, 91058 Erlangen, Germany), Schellenberger, MS (Fraunhofer IISB, Schottkystrasse 10, 91058 Erlangen, Germany), Beck, UB (BAM-Federal Institute for Materials Research and Testing, Unter den Eichen 87, 12200 Berlin, Germany) and Hertwig, AH (BAM-Federal Institute for Materials Research and Testing, Unter den Eichen 87, 12200 Berlin, Germany)
Keywords:

Spectroscopic imaging and mapping ellipsometry, Inhomogeneous and patterned thin films, SiO2, Photoresist

Document typeArticle
Journal title / SourceThin Solid Films
Peer-reviewed articleYes
Volume571
Issue3
Page numbers / Article number601-604
Publisher's nameElsevier
Publisher's address (city only)Amsterdam, Netherlands
Publication date 2014-11-28
ISSN0040-6090
DOI10.1016/j.tsf.2013.11.052
Web URLhttp://www.sciencedirect.com/science/article/pii/S0040609013019056
LanguageEnglish

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