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High Aspect Ratio PS‑b‑PMMA Block Copolymer Masks for Lithographic Applications

Ferrarese Lupi, F. (Laboratorio MDM, INM-CNR, Brianza, Italy), Giammaria, T.J. (Laboratorio MDM, INM-CNR, Brianza, Italy), Volpe, F.G. (Laboratorio MDM, INM-CNR, Brianza, Italy), Lotto, F. (Laboratorio MDM, INM-CNR, Brianza, Italy), Seguini, G. (Laboratorio MDM, INM-CNR, Brianza, Italy), Pivac, B. (Inst Ruder Boskovic, Zagreb, Croatia), Laus, M. (Universitá del Piemont Orientale, Allesandria, Italy) and Perego, M. (Universitá del Piemont Orientale, Allesandria, Italy)

block copolymer, self-assembly, nanolithography, high aspect-ratio, rapidt hermal processing, PS-b-PMMA

Document typeArticle
Journal title / SourceACS Applied Materials & Interfaces
Peer-reviewed articleYes
Page numbers / Article number21389−21396
Publisher's nameACS Publications Ameican Chemical Society
Publisher's address (city only)Washington
Publication date 2014-11-11
Web URLhttp://pubs.acs.org/doi/abs/10.1021/am506391n

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