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A second generation of low thermal noise cryogenic silicon resonators

Matei, D (Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany), Legero, T (Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany), Grebing, C (Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany), Häfner, S (Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany), Lisdat, C (Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany), Weyrich, R (Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany), Zhang, W (JILA, National Institute of Standards and Technology and University of Colorado, 440 UCB, Boulder, CO 80309-0440, USA), Sonderhouse, L (JILA, National Institute of Standards and Technology and University of Colorado, 440 UCB, Boulder, CO 80309-0440, USA), Robinson, J M (JILA, National Institute of Standards and Technology and University of Colorado, 440 UCB, Boulder, CO 80309-0440, USA), Riehle, F (Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany), Ye, J (JILA, National Institute of Standards and Technology and University of Colorado, 440 UCB, Boulder, CO 80309-0440, USA) and Sterr, U (Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, 38116 Braunschweig, Germany)
Keywords:

ultrastable laser, thermal noise, coating, silicon resonator

Document typeArticle
Journal title / SourceJournal of Physics: Conference Series
Peer-reviewed articleYes
Volume723
Issue1
Page numbers / Article number012031
Publisher's nameIOP Publishing
Publisher's address (city only)Bristol, UK
Publication date 2016-07-4
ISSN1742-6596
DOI10.1088/1742-6596/723/1/012031
Web URLhttp://iopscience.iop.org/article/10.1088/1742-6596/723/1/012031/meta
LanguageEnglish

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