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Graphene metrology

Janssen, T.J.B.M. (NPL, Teddington, UK), Giusca, C. (NPL, Teddington, UK), Gallop, J. (NPL, Teddington, UK), Hao, L. (NPL, Teddington, UK), Kazakova, O. (NPL, Teddington, UK), Panchal, V. (NPL, Teddington, UK), Pierce, R. (NPL, Teddington, UK) and Tzalenchuk, A. (NPL, Teddington, UK)
Keywords:

C,Conductivity,Graphene,Metrology,Microwave measurement,Resistance,Silicon carbide,Substrates,electrical conductivity measurement,functional property,graphene,graphene metrology,graphene morphology,graphene topography,industrial production,joining processes,linking morphology,measurement standards,microwave materials,microwave measurement,noncontact microwave conductivity measurement,quality control,quantum Hall effect,rapid noninvasive quality control

Document typeProceeding
Journal title / Source29th Conference on Precision Electromagnetic Measurements (CPEM 2014)
Page numbers / Article number662-663
Publisher's nameIEEE
Publication date 2014-08
ISSN0589-1485
DOI10.1109/CPEM.2014.6898559
ISBN978-1-4799-2479-0
Web URLhttp://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=6898559
LanguageEnglish

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