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Surface Layer Analysis of Si Sphere by XRF and XPS

Zhang, L. Z. (AIST, Tsukuba, Japan), Azuma, Y. A. (AIST, Tsukuba, Japan), Kurokawa, A. K. (AIST, Tsukuba, Japan), Kuramoto, N. K. (AIST, Tsukuba, Japan) and Fujii, K. F. (AIST, Tsukuba, Japan)
Keywords:

Chemical analysis, silicon, surface contamination, thickness measurement, X-ray spectroscopy

Document typeArticle
Journal title / SourceIEEE Transaction on Instrumentation and Measurement
Peer-reviewed articleYes
Volume64
Issue6
Page numbers / Article number1509-1513
Publisher's nameInstitution of Electrical and Electrical Engineering (IEEE)
Publisher's address (city only)Piscataway
Publication date 2015-02-2
ISSN0018-9456
DOI10.1109/TIM.2015.2389352
Web URLhttp://ieeexplore.ieee.org/xpl/abstractAuthors.jsp?arnumber=7029043&refinements%3D4294557292%26filter%3DAND%28p_IS_Number%3A7104190%29
LanguageEnglish
Persistent IdentifierINSPEC Accession Number: 15111454

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