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Comparative measurements on atomic layer deposited Al2O3 thin films using ex situ table top and mapping ellipsometry, as well as X-ray and VUV reflectometry

Petrik, PP (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany, Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hung), Gumprecht, TG (Erlangen Graduate School in Advanced Optical Technologies (SAOT), Paul-Gordan-Strasse 9, 91052 Erlangen, Germany), Nutsch, AN (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany), Roeder, GR (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany), Lemberger, ML (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany), Juhasz, GJ (Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hungary), Polgar, OP (Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hungary), Major, CM (Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hungary), Kozma, PK (Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hungary), Janosov, MJ (Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hungary), Fodor, BF (Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hungary,Faculty of Science, University of Pécs, 7624 Pécs, Ifjuság útja 6, Hungary), Agocs, EA (Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hungary, Doctoral School of Molecular- and Nanotechnologies, Faculty of Information Technology, University of Pannon) and Fried, MF (Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hungary, Doctoral School of Molecular- and Nanotechnologies, Faculty of Information Technology, University of Pannon)
Keywords:

Spectroscopic ellipsometry, X-ray reflectometry, VUV reflectometry, Atomic layer deposition, Ultra-thin layer

Document typeArticle
Journal title / SourceThin Solid Films
Peer-reviewed articleYes
Volume541
IssueCurrent Trends in Optical and X-Ray Metrology of Advanced Materials for Nanoscale Devices III
Page numbers / Article number131-135
Publisher's nameElsevier
Publisher's address (city only)Amsterdam, Netherlands
Publication date 2013-08-31
ISSN0040-6090
DOI10.1016/j.tsf.2012.12.091
Web URLhttp://www.sciencedirect.com/science/article/pii/S0040609013000175
LanguageEnglish

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