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A prototype of RK=200 quantum Hall array resistance standard on epitaxial graphene

Lartsev, A. (Department of Microtechnology and Nanoscience, Chalmers University of Technology, Göteborg, Sweden), Lara-Avila, S. (Department of Microtechnology and Nanoscience, Chalmers University of Technology, Göteborg, Sweden), Danilov, A. (Department of Microtechnology and Nanoscience, Chalmers University of Technology, Göteborg, Sweden), Tzalenchuk, A. (National Physical Laboratory, Teddington, UK/ Royal Holloway, University of London, Egham, UK), Yakimova, R. (Department of Physics, Chemistry and Biology (IFM), Linköping University, Linköping, Sweden/ Graphensic AB, Linköping, Sweden) and Kubatkin, S. (Department of Microtechnology and Nanoscience, Chalmers University of Technology, Göteborg, Sweden)
Keywords:

Epitaxial graphene, silicon carbide, Hall, graphene, measurement,

Document typeArticle
Journal title / SourceA prototype of RK=200 quantum Hall array resistance standard on epitaxial graphene
Peer-reviewed articleYes
Volume118
Issue4
Page numbers / Article number044506
Publisher's nameAIP Publishing
Publication date 2015-07
ISSN0021-8979
DOI10.1063/1.4927618
Web URLhttp://scitation.aip.org/content/aip/journal/jap/118/4/10.1063/1.4927618
LanguageEnglish

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