Characterization of ZnO structures by optical and X-ray methods
Petrik, PP (Fraunhofer Institute for Integrated Systems and Device Technology, Institute for Technical Physics and Materials Science (MFA)), Pollakowski, BP (Physikalisch-Technische Bundesanstalt (PTB)), Zakel, SZ (Physikalisch-Technische Bundesanstalt (PTB)), Gumprecht, TG (Fraunhofer Institute for Integrated Systems and Device Technology, Erlangen Graduate School in Advanced Optical Technologies (SAOT)), Beckhoff, BB (Physikalisch-Technische Bundesanstalt (PTB)), Lemberger, ML (Fraunhofer Institute for Integrated Systems and Device Technology), Labadi, ZL (Institute for Technical Physics and Materials Science (MFA)), Baji, ZB (Institute for Technical Physics and Materials Science (MFA)), Jank, MJ (Fraunhofer Institute for Integrated Systems and Device Technology) and Nutsch, AN (Physikalisch-Technische Bundesanstalt (PTB))Zinc oxide, Spectroscopic ellipsometry, X-ray fluorescence, Raman spectrometry, VUV reflectometry, Atomic layer deposition, Sputtering
Document type | Article |
Journal title / Source | Applied Surface Science |
Peer-reviewed article | Yes |
Volume | 281 |
Page numbers / Article number | 123-128 |
Publisher's name | Elsevier |
Publisher's address (city only) | Philadelphia |
Publication date | 2013-09-15 |
ISSN | 0169-4332 |
DOI | 10.1016/j.apsusc.2012.12.035 |
Web URL | http://www.sciencedirect.com/science/article/pii/S0169433212021861 |
Language | English |