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Characterization of ZnO structures by optical and X-ray methods

Petrik, PP (Fraunhofer Institute for Integrated Systems and Device Technology, Institute for Technical Physics and Materials Science (MFA)), Pollakowski, BP (Physikalisch-Technische Bundesanstalt (PTB)), Zakel, SZ (Physikalisch-Technische Bundesanstalt (PTB)), Gumprecht, TG (Fraunhofer Institute for Integrated Systems and Device Technology, Erlangen Graduate School in Advanced Optical Technologies (SAOT)), Beckhoff, BB (Physikalisch-Technische Bundesanstalt (PTB)), Lemberger, ML (Fraunhofer Institute for Integrated Systems and Device Technology), Labadi, ZL (Institute for Technical Physics and Materials Science (MFA)), Baji, ZB (Institute for Technical Physics and Materials Science (MFA)), Jank, MJ (Fraunhofer Institute for Integrated Systems and Device Technology) and Nutsch, AN (Physikalisch-Technische Bundesanstalt (PTB))
Keywords:

Zinc oxide, Spectroscopic ellipsometry, X-ray fluorescence, Raman spectrometry, VUV reflectometry, Atomic layer deposition, Sputtering

Document typeArticle
Journal title / SourceApplied Surface Science
Peer-reviewed articleYes
Volume281
Page numbers / Article number123-128
Publisher's nameElsevier
Publisher's address (city only)Philadelphia
Publication date 2013-09-15
ISSN0169-4332
DOI10.1016/j.apsusc.2012.12.035
Web URLhttp://www.sciencedirect.com/science/article/pii/S0169433212021861
LanguageEnglish

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