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Towards Quantum Resistance Metrology Based on Graphene

Ahlers, F. (Physikalisch-Technische Bundesanstalt (PTB), Braunschweig, Germany), Kučera, J. (Český Metrologický Institut (CMI), Brno, Czech Republic), Poirier, W. (Laboratoire national de métrologie et d’essais (LNE), Paris, France), Jeanneret, B. (Federal Institute of Metrology (METAS), Bern-Wabern, Switzerland), Satrapinski, A. (Mittatekniikan Keskus (MIKES), Espoo, Finland), Tzalenchuk, A. (NPL Management Limited, Teddington, United Kingdom), Vrabček, P. (Slovenský Metrologický Ústav (SMU), Bratislava, Slovakia), Bergsten, T. (SP Sveriges Tekniska Forskningsinstitut AB, Borås, Sweden), Hwang, C. (Korea Research Institute of Standards and Science (KRISS), Daejeon, Republic of Korea), Yakimova, R. (Linköpings universitet, Linköping, Sweden) and Kubatkin, S. (Chalmers tekniska högskola, Gothenburg, Sweden)
Keywords:

Measurement standards, resistance, quantum hall effect, graphene, C, Calibration, EMRP project GraphOhm, Electrical resistance measurement, Hall effect devices, JRP, Materials, Metrology, Resistance, Standards, electric resistance measurement, electrical measurement, intrinsically referenced resistance standard disse, joint research project, quantum resistance metrology standard, semiconductor quantum Hall device

Document typeProceeding
Journal title / SourceThe EMRP Project GraphOhm - Towards Quantum Resistance Metrology Based on Graphene
Page numbers / Article number548-549
Publisher's nameIEEE
Publication date 2014
Conference date24-29 Aug. 2014
Conference placeRio de Janeiro
ISSN0589-1485
DOI10.1109/CPEM.2014.6898502
ISBN978-1-4799-2479-0
Web URLhttp://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=6898502
LanguageEnglish

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