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CVD Graphene for Electrical Quantum Metrology

Thodkar, K. (University of Basel, Basel, Switzerland), Nef, C. (University of Basel, Basel, Switzerland), Fu, W. (University of Basel, Basel, Switzerland), Schönenberger, C. (University of Basel, Basel, Switzerland), Calame, M. (University of Basel, Basel, Switzerland), Lüönd, F. (METAS, Bern-Wabern, Swisse), Overney, F. (METAS, Bern-Wabern, Swisse) and Jeanneret, B. (METAS, Bern-Wabern, Swisse)
Keywords:

C,CVD graphene,Chemical Vapor Deposition (CVD),Copper (Cu),Electrical resistance measurement,Films,Graphene,Graphene (G),Magnetic field measurement,Quantum Hall effect (QHE),Raman spectra,Raman spectroscopy,Resistance,Substrates,Temperature measurement,chemical vapor deposition,chemical vapour deposition,electric variables measurement,electrical quantum metrology,electrical transport measurements,graphene,quantum Hall effect

Document typeProceeding
Journal title / Source29th Conference on Precision Electromagnetic Measurements (CPEM 2014),
Page numbers / Article number540--541
Publisher's nameIEEE
Publication date 2014-08
ISSN0589-1485
DOI10.1109/CPEM.2014.6898498
ISBN978-1-4799-2479-0
Web URLhttp://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=6898498
LanguageEnglish

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