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Determination of line profiles on photomasks using DUV, EUV and X-ray scattering

Scholze, F. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Bodermann, B. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Burger, S. (JCMwave GmbH, Bolivarallee 22, D-14050 Berlin, Germany), Endres, J. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Haase, A. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Krumrey, M. (Physikalisch-Technische Bundesanstalt Braunschweig and Berlin, Bundesallee 100, D- 38116, Braunschweig, Germany), Laubis, C. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee100, D-38116 Braunschweig), Soltwisch, V. (Physikalisch-Technische Bundesanstalt Braunschweig and Berlin, Bundesallee 100, D- 38116, Braunschweig, Germany), Ullrich, A. (Advanced Mask Technology Center, Rähnitzer Allee 9, 01109 Dresden, Germany) and Wernecke, J. (Physikalisch-Technische Bundesanstalt Braunschweig and Berlin, Bundesallee 100, D- 38116, Braunschweig, Germany)
Keywords:

scatterometry, GISAXS, EUV-scatterometry, line structure

Document typeProceeding
Journal title / SourceProc SPIE
Volume9231
Publication date 2015
Conference name30th European Mask and Lithography Conference
Conference dateJune 24, 2014
Conference placeDresden, Germany
DOI10.1117/12.2065941
LanguageEnglish

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