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Dual beam organic depth profiling using large argon cluster ion beams

Holzweber, M., Shard, A. G., Jungnickel, H., Luch, A. and Unger, W. E.S.

SIMS; organic depth profiling; argon cluster; ToF-SIMS; Ar-GCIB

Document typeProceeding
Journal title / SourceSurface and Interface Analysis
Publication date 2014-03-18
Conference nameEuropean Applications of Surface and Interface Analysis - ECASIA'13
Conference dateOctober 13-18, 2013
Conference placeSardinia
Web URLhttp://onlinelibrary.wiley.com/doi/10.1002/sia.5429/abstract

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