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Characterization of HMDS treated CVD Graphene

Thodkar, K. (University of Basel, Switzerland), Schönenberger, C. (University of Basel, Switzerland), Calame, M. (University of Basel, Switzerland), Lüönd, F. (METAS, Switzerland), Overney, F. (METAS, Switzerland) and Jeanneret, B. (METAS, Switzerland)
Keywords:

Chemical vapor deposition (CVD), Hexame-thyldisilazane (HMDS), Copper (Cu), CVD graphene (CVDG)

Document typeProceeding
Journal title / SourceDigest on Conference on Precision Electromagnetic Measurements (CPEM2016)
Peer-reviewed articleYes
Publisher's nameIEEE
Publication date 2016-08-16
Conference nameCPEM 2016
Conference date10-07-2016 to 15-07-2016
Conference placeOttawa, Canada
ISSN2160-0171
DOI10.1109/CPEM.2016.7540498
ISBN978-1-4673-9134-4
Web URLhttp://ieeexplore.ieee.org/document/7540498/
LanguageEnglish

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