The Effect of Bilayer Regions on the Response of Epitaxial Graphene Devices to Environmental Gating
Hill-Pearce, R. E. (NPL, Teddington, UK), Eless, V (NPL, Teddington, UK), Lartsev, A (Chalmers University of Technology, Göteborg, Sweden), Martin, N. A. (NPL, Teddington, UK), Barker-Snook, I. L. (NPL, Teddington, UK), Helmore, J. J. (NPL, Teddington, UK), Yakimova, R. (Linköping University, Linköping, Sweden), Gallop, J. C. (NPL, Teddington, UK) and Hao, L (NPL, Teddington, UK)grapheme, metrology, scanning Kelvin probe microscopy
| Document type | Article |
| Journal title / Source | Carbon |
| Peer-reviewed article | Yes |
| Volume | 93 |
| Issue | n/a |
| Page numbers / Article number | 896–902 |
| Publisher's name | Elsevier |
| Publisher's address (city only) | Amsterdam |
| Publication date | 2015-05-23 |
| ISSN | n/a |
| DOI | 10.1016/j.carbon.2015.05.061 |
| Web URL | http://www.sciencedirect.com/science/article/pii/S0008622315004686 |
| Language | English |