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Fast Simulation Method for Parameter Reconstruction in Optical Metrology

Burger, S. (Zuse Institute Berlin (ZIB), Takustraße 7, D– 14 195 Berlin, Germany; JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany), Zschiedrich, L. (JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany), Pomplun, J. (JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germ), Schmidt, F. (Zuse Institute Berlin (ZIB), Takustraße 7, D– 14 195 Berlin, Germany; JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany) and Bodermann, B. (Physikalisch-Technische Bundesanstalt, Bundesallee 100, D-38116, Braunschweig, Germany)
Keywords:

Scatterometry, optical metrology, 3D rigorous electromagnetic field simulations, computational metrology, computational lithography, finite-element methods

Document typeProceeding
Journal title / SourceProc SPIE
Volume8681
Publication date 2015
Conference nameSPIE Metrology, Inspection, and Process Control for Microlithography XXVII
Conference dateFebruary 24, 2013
Conference placeSan Jose, California, United States
DOI10.1117/12.2011154
LanguageEnglish

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