Fast Simulation Method for Parameter Reconstruction in Optical Metrology
Burger, S. (Zuse Institute Berlin (ZIB), Takustraße 7, D– 14 195 Berlin, Germany; JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany), Zschiedrich, L. (JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany), Pomplun, J. (JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germ), Schmidt, F. (Zuse Institute Berlin (ZIB), Takustraße 7, D– 14 195 Berlin, Germany; JCMwave GmbH, Bolivarallee 22, D– 14 050 Berlin, Germany) and Bodermann, B. (Physikalisch-Technische Bundesanstalt, Bundesallee 100, D-38116, Braunschweig, Germany)Scatterometry, optical metrology, 3D rigorous electromagnetic field simulations, computational metrology, computational lithography, finite-element methods
| Document type | Proceeding |
| Journal title / Source | Proc SPIE |
| Volume | 8681 |
| Publication date | 2015 |
| Conference name | SPIE Metrology, Inspection, and Process Control for Microlithography XXVII |
| Conference date | February 24, 2013 |
| Conference place | San Jose, California, United States |
| DOI | 10.1117/12.2011154 |
| Language | English |