Characterization of Thin ZnO Films by Vacuum Ultra-Violet Reflectometry
Gumprecht, TG (Erlangen Graduate School in Advanced Optical Technologies (SAOT), Paul-Gordan-Strasse 9, 91052 Erlangen, Germany), Petrik, PP (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany, Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hung), Roeder, GR (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany), Schellenberger, MS (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany), Pfitzner, LP (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany), Pollakowski, BP (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany) and Beckhoff, BB (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany)Zink oxide, vacuum ultra-violet reflectometry, spectroscopic ellipsometry, atomic layer deposition
Document type | Proceeding |
Journal title / Source | Materials Research Society Proceedings |
Peer-reviewed article | Yes |
Volume | 1494 |
Issue | Symposium F - Oxide Semiconductors and Thin Films |
Page numbers / Article number | 65-70 |
Publisher's name | Cambridge Journals Online |
Publisher's address (city only) | Cambridge |
Publication date | 2013 |
Conference name | 2012 MRS Fall Meeting |
Conference date | 25-11-2012 to 30-11-2012 |
Conference place | Boston, Massachusetts |
ISSN | 1946-4274 |
DOI | 10.1557/opl.2012.1677 |
Web URL | http://journals.cambridge.org/action/displayAbstract?fromPage=online&aid=8800651&fileId=S1946427412016776 |
Language | English |