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Characterization of Thin ZnO Films by Vacuum Ultra-Violet Reflectometry

Gumprecht, TG (Erlangen Graduate School in Advanced Optical Technologies (SAOT), Paul-Gordan-Strasse 9, 91052 Erlangen, Germany), Petrik, PP (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany, Institute for Technical Physics and Materials Science (MFA), Research Center for Natural Sciences, Konkoly Thege u. 29-33., 1121 Budapest, Hung), Roeder, GR (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany), Schellenberger, MS (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany), Pfitzner, LP (Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, 91058 Erlangen, Germany), Pollakowski, BP (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany) and Beckhoff, BB (Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany)
Keywords:

Zink oxide, vacuum ultra-violet reflectometry, spectroscopic ellipsometry, atomic layer deposition

Document typeProceeding
Journal title / SourceMaterials Research Society Proceedings
Peer-reviewed articleYes
Volume1494
IssueSymposium F - Oxide Semiconductors and Thin Films
Page numbers / Article number65-70
Publisher's nameCambridge Journals Online
Publisher's address (city only)Cambridge
Publication date 2013
Conference name2012 MRS Fall Meeting
Conference date25-11-2012 to 30-11-2012
Conference placeBoston, Massachusetts
ISSN1946-4274
DOI10.1557/opl.2012.1677 
Web URLhttp://journals.cambridge.org/action/displayAbstract?fromPage=online&aid=8800651&fileId=S1946427412016776
LanguageEnglish

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