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Comparison of CD measurements of an EUV photomask by EUV scatterometry and CD-AFM

Scholze, F. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Soltwisch, V. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Dai, G. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany), Henn, M.-A. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany) and Gross, H. (Physikalisch-Technische Bundesanstalt, Braunschweig & Berlin, Bundesallee 100, D-38116, Braunschweig, Germany)
Keywords:

mask metrology, EUV lithography, CD metrology, line edge roughness, line width roughness

Document typeProceeding
Journal title / SourceProc. of SPIE
Volume8880
Publication date 2013-09-9
Conference namePhotomask Technology 2013
Conference dateSeptember 10, 2013
Conference placeMonterey, California, United States
DOI10.1117/12.2025827
Web URLhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1736337
LanguageEnglish

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